The Glider line is specifically designed for industrial applications requiring high quality pin-hole free deposition on large area parts and substrates. Its flexible and scalable design allows for easy customization of chamber configuration to suit our customers needs.

Glider SMFD-ALD™ systems provide breakthrough capabilities such as high throughput ALD at low temperature deposition, fast, high quality and low-stress thick films deposition up to about 12 microns, efficient chemical use and high productivity.

Our current Glider systems include three different models that cover a large range of process space volume, from 1.5-80 liter. The G1000-P accommodates panels coating up to a maximum size of 1000×1000 mm. In addition, custom Glider systems are made per customer specifications to accommodate any size and shape.

Features and Benefits

  • High throughput per substrate
  • Low Maintenance with up time matching and exceeding legacy CVD and PVD equipment
  • Low consumables cost- up to 90% chemical utilization efficiency
  • ETL Certified
  • Sub-atmospheric abatement for ‘Zero Waste’ process
  • Flexible and scalable system configuration
  • Fully interlocked for safety and zero-emission
  • Small footprint
  • Low cost of ownership


  • Thick film deposition ( up to 12 micron)
  • Fast ALD deposition at low temperatures
  • Low temperature processing (down to 70 °C)
  • 100% conformal films over any substrate topology
  • Seamless incorporation of nano-laminates with reproducible atomic-layer control
  • Composite ternary and quaternary alloy films with no throughput penalty

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